Inorganic Non-Metallic Targets

99.9% Pure BiFe0.95Mn0.05O3 Sputtering Target

99.9% Pure BiFe0.95Mn0.05O3 Sputtering Target

3N BiFe0.95Mn0.05O3 with 10 at% excess Bi Sputtering Target

3N BiFe0.95Mn0.05O3 with 10 at% excess Bi Sputtering Target

8YSZ ZrO2 Stabilized 8mol% Y2O3 Sputtering Target

8YSZ ZrO2 Stabilized 8mol% Y2O3 Sputtering Target

3N ZrO2 8YSZ Sputtering Target

3N ZrO2 8YSZ Sputtering Target

99.99% Zinc Oxide Doped with Ga2O3 Sputtering Target

99.99% Zinc Oxide Doped with Ga2O3 Sputtering Target

4N Ga2O3-ZnO(Ga2O3 0.5~1wt%) Sputtering Target

4N Ga2O3-ZnO(Ga2O3 0.5~1wt%) Sputtering Target

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