Description of Pure Hf Hafnium Discs

Our Pure Hf Hafnium Discs resolve common frustrations encountered in high‑temperature and semiconductor‑grade PVD workflows. Poor grain consistency and residual impurities in generic hafnium discs often cause uneven erosion during sputtering, triggering inconsistent thin‑film quality and unreliable experimental repeatability. We utilise high‑purity hafnium feedstock combined with optimised forming and heat‑treatment workflows to achieve homogeneous grain structure across each disc. Rigorous quality control keeps trace contaminants low, supporting consistent erosion behaviour during barrier‑layer deposition, high‑temperature coating research, and lab‑scale material evaluations. Every disc goes through dimensional and purity validation before delivery. Multiple standard diameters and thickness options are offered. Backing‑plate bonding service is available for convenient chamber mounting, while custom‑sized discs can be produced to match your unique experimental hardware. Reduce unnecessary substrate waste caused by erratic material performance, so you can channel more lab capacity toward advancing your thin‑film research projects efficiently. 

Features of Pure Hf Hafnium Discs

1. Pure hafnium discs for sputtering  

2. High-purity Hf for thin films 

3. Excellent thermal stability for coatings  

4. Ideal for semiconductor gate electrodes  

5. Custom diameters and thicknesses available  

6. Dense microstructure for uniform erosion  

7. Low impurity for device-grade performance  

8. Suitable for DC and RF magnetron  

9. Supplied with purity analysis certificate  

10. Vacuum-sealed for oxidation protection

Applications of Pure Hf Hafnium Discs

Semiconductor industry: High-purity hafnium target material is converted into HfO ₂ high-k gate dielectric thin film through the sputtering process, replacing traditional silicon dioxide and solving the leakage current problem of advanced process chips. It is a key material for 45nm and below node chips. The purity of such target materials is usually required to be above 99.99%.

Nuclear industry: Utilizing its excellent neutron absorption capability, it is processed into control rods or neutron-absorbing materials for regulating nuclear reaction rates, and has been maturely applied in ship reactors.

Aerospace: Used for preparing high-temperature-resistant and erosion-resistant coatings, applied to the surfaces of components such as rocket engine nozzles and thermal protection systems.

Optical coating: Hafnium-based thin films formed by sputtering can be used to manufacture optical components such as high-reflectivity mirrors and filters. ‌

Specifications of Pure Hf Hafnium Discs

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 3N5(99.95%).

⚠️  Precautions

The purity, surface smoothness, and density of the wafer/target directly affect the quality of the coating. Semiconductor grade products have extremely strict restrictions on impurity elements such as boron and cadmium with large neutron absorption cross sections.

In addition to semiconductor target materials, hafnium wafers may also refer to hafnium block processed parts used in the nuclear industry, and specific usage and specification requirements need to be confirmed when selecting. ‌‌