Description of Pure C Carbon Sputtering Target

Our Pure C Carbon Sputtering Target addresses frequent headaches researchers face with low‑grade carbon sources, including high background impurities, flaking particles, and erratic sputter rates that ruin experimental batches. Strict raw‑material screening and refined sintering deliver high‑purity carbon with uniform microstructure for stable discharge performance. Consistent density across the target surface limits unexpected material shedding, so your deposited carbon thin‑films stay clean and predictable run after run. It performs reliably for tribological protective layers, SEM sample coating, and diverse advanced material research work. We supply multiple standard sizes, with backing plate bonding available for easier equipment installation. If standard dimensions do not fit your chamber setup, custom modifications are also offered. By removing unpredictable variables from your deposition workflow, this target helps you spend less time troubleshooting defects and more time focusing on your core research and development goals.

Features of Pure C Carbon Sputtering Target

Purity and microstructure: The purity and grain size of the target material directly affect the quality of the thin film and sputtering rate, and high-purity fine-grain target materials have more stable performance.

Conductivity: Carbon targets belong to conductive materials and are suitable for direct current (DC) sputtering; however, radio frequency (RF) sputtering can also process carbon materials.

Customized services: Indium bonding and other services can be provided to adapt to different backboards. ‌‌

Applications of Pure C Carbon Sputtering Target

SEM sample preparation: In a scanning electron microscope, a carbon target is used to coat a conductive carbon film of about 10nm on non-conductive samples to eliminate charging effects; And the X-ray peak of carbon does not conflict with other elements, making it suitable for subsequent energy dispersive X-ray (EDX) analysis.

Diamond-like carbon (DLC) film: Carbon target is a key raw material for preparing DLC coatings. DLC has high hardness, low friction coefficient, and chemical stability, and is used for wear-resistant and anti-corrosion coatings.

Nuclear physics experiments: Customized carbon targets can be used for beam strippers or nuclear physics targets in accelerator experiments.

Optics and Semiconductors: Carbon-based thin film deposition for optical coating and microelectronics. ‌‌

Specifications of Pure C Carbon Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).