Description of Mg Magnesium Sputter Target

Magnesium stands out for its favourable sputter yield, making it a practical choice for creating lightweight functional thin‑films within vacuum deposition workflows. Its active chemical nature brings real‑world coating hurdles; improper target microstructure can trigger uneven erosion and inconsistent layer thickness across substrates. Our magnesium sputter targets are produced from high‑purity raw material, tuned to handle typical vacuum sputtering conditions. These targets deposit magnesium‑based films widely adopted in battery‑related research, optoelectronic devices, and protective surface coating systems. Each unit is inspected for surface integrity and dimensional accuracy before packaging. Compatible with laboratory sputter chambers and pilot production coating equipment. Balanced material characteristics support predictable deposition behaviour, helping you cut down trial‑and‑error cycles and obtain reliable thin‑film data for your energy‑focused and advanced material research projects.

Features of Mg Magnesium Sputter Target

1. High-purity magnesium for quality thin films  

2. Dense target for reduced particle emission  

3. Excellent uniformity for optical coatings  

4. Custom dimensions for various sputter guns  

5. Low gas content for stable deposition  

6. Suitable for DC and RF sputtering  

7. Ideal for research and pilot production  

8. Supplied with purity analysis certificate  

9. Oxidation-resistant vacuum packaging  

10. Fast shipping for time-sensitive projects

Applications of Mg Magnesium Sputter Target

Semiconductors and display panels: Used for depositing magnesium thin films; purity and impurity control are critical factors, as fluctuations in material purity can affect the electrical or optical properties of the film.

Optical coating: Film uniformity directly impacts product appearance and performance consistency; target density, grain structure, and processing techniques influence the stability of the sputtering process.

Energy storage batteries: Magnesium oxide sputtering targets can be utilized in coating processes for energy storage batteries.

Decorative coating: Magnesium material is deposited onto substrate surfaces via magnetron sputtering to form functional coatings.

Scientific research: Universities and research institutes frequently use customized magnesium targets, with specifications such as purity (99.9%–99.999%), dimensions, and crystal orientations tailored to specific requirements.

Specifications of Mg Magnesium Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).

Key Considerations for Selecting Mg Magnesium Sputter Target

Purity Grade: High-end applications, such as semiconductors, require purity levels of 4N (99.99%) or even 5N (99.999%) and above, as purity directly affects thin-film performance.

Density: High density (e.g., relative density ≥99.3%) helps improve sputtering rates and thin-film performance while extending the target's service life.

Grain Size: Fine, uniform grains facilitate the deposition of thin films with uniform thickness distribution.

Customization Requirements: These encompass target dimensions, shape, purity grade, alloy composition, and specific performance requirements; different coating equipment entails specific demands regarding target geometry and mounting methods.