Description of Magnesium Sputtering Target

Magnesium sputtering targets pose real processing challenges due to the metal’s low melting point. Sudden thermal fluctuations during deposition can trigger surface degradation and inconsistent film layers, ruining your coating batches. Our magnesium sputtering targets are manufactured from high‑purity raw material with well‑controlled microstructures to counter these common sputtering risks. They offer favourable sputter yield for depositing uniform magnesium thin films, widely applied in semiconductor barrier layers, photovoltaic devices and functional surface coatings. Each target goes through rigorous surface evaluation and dimensional inspection before leaving our facility. Optimised for lab research and pilot coating lines, these targets support steady deposition performance. Reliable material characteristics help keep your thin‑film processes stable and deliver consistent sample quality for optoelectronic and advanced material development work.

Features of Magnesium Sputtering Target

1. High-purity magnesium for precise sputtering  

2. Dense target for consistent film quality  

3. Custom dimensions to fit your system  

4. Excellent uniformity for optical coatings 

5. Low impurity for reliable semiconductor use  

6. Vacuum-sealed packaging for freshness  

7. Ideal for research and production scaling 

8. Strong bonding for stable deposition  

9. Available with material test certificates 

10. Quick delivery for tight project timelines

Applications of Magnesium Sputtering Target

Magnesium sputtering targets can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD), display, and optical applications.

Specifications of Magnesium Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).