Description of High Purity C Carbon Sputter Target

Impurity residues within carbon sputter targets can easily introduce unwanted contaminants into deposited films, which disturbs performance for high‑sensitivity R‑D work. Even minor trace elements may alter mechanical or electrical properties of carbon layers, ruining carefully planned experimental outcomes for precision coating projects. Our high‑purity carbon sputter target is processed with refined raw‑material selection and advanced consolidation techniques to keep impurity levels low. It delivers clean carbon‑based thin‑films suitable for tribological protective coatings, carbon‑film sensor components and semiconductor‑related laboratory studies. Every target receives impurity testing, dimensional calibration and careful surface evaluation before shipment. Compatible with most standard magnetron sputtering systems for lab‑scale and pilot‑level coating tasks. Its purified material base lowers the risk of unintended film contamination, helping you achieve stable and trustworthy coating results for your high‑precision thin‑film development.

Features of High Purity C Carbon Sputter Target

1. High-purity carbon for superior film quality  

2. Dense graphite for stable sputter rates  

3. Excellent conductivity for electron-beam applications  

4. Ideal for DLC and hard coatings 

5. Low impurity for consistent thin-film performance  

6. Custom sizes for R&D and production  

7. Excellent thermal shock resistance  

8. Suitable for DC and RF magnetron systems  

9. Supplied with purity analysis certificate  

10. Vacuum-sealed for contamination prevention

Applications of High Purity C Carbon Sputter Target

Microelectronics and Semiconductors: Used to fabricate conductive and barrier layers in integrated circuits for chip manufacturing.

Hard Coatings: Thin films produced from carbon sputtering targets exhibit exceptional hardness, serving as wear-resistant coatings for tools, molds, and similar components.

Magnetic Storage: Used in the fabrication of recording media such as hard disk drives and magnetic heads; carbon targets are widely used materials in the information storage industry.

Amorphous Carbon Films: Amorphous carbon films produced via high-power impulse magnetron sputtering (HiPIMS) feature high hardness, a low coefficient of friction, and excellent wear resistance.

Specifications of High Purity C Carbon Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).