Description of Custom C Carbon Sputtering Target

Off‑the‑shelf carbon sputtering targets often fail to fit non‑standard chamber layouts or special experimental setups. Mismatched dimensions or poorly optimised density can bring excessive particle shedding, ruining valuable substrates and slowing down your custom coating trials. Our custom C carbon sputtering target is built around your exact specifications. We adjust geometry, density and surface finish to match your cathode hardware and deposition goals. It delivers clean carbon‑based thin‑films for tribological coatings, sensor structures and one‑of‑a‑kind laboratory research. Each unit goes through dimensional cross‑checking and surface quality review before leaving our workshop. Suited for unique lab configurations and small‑batch pilot projects. Bespoke material tuning reduces particle‑related defects, letting you run stable deposition cycles and get consistent results for your specialised thin‑film development.

Features of Custom C Carbon Sputtering Target

1. Custom carbon targets for unique systems 

2. High-purity graphite for quality films  

3. Dense structure for stable sputtering  

4. Precision machined to your dimensions  

5. Ideal for DLC and conductive layers  

6. Excellent thermal shock resistance  

7. Low particle emission during deposition 

8. Supplied with material certificates  

9. Vacuum-sealed for contamination-free use  

10. Fast turnaround for custom orders

Applications of Custom C Carbon Sputtering Target

Microelectronics and Semiconductors: Used to fabricate conductive and barrier layers in integrated circuits for chip manufacturing.

Hard Coatings: Thin films produced from carbon sputtering targets exhibit exceptional hardness, serving as wear-resistant coatings for tools, molds, and similar components.

Magnetic Storage: Used in the fabrication of recording media such as hard disk drives and magnetic heads; carbon targets are widely used materials in the information storage industry.

Amorphous Carbon Films: Amorphous carbon films produced via high-power impulse magnetron sputtering (HiPIMS) feature high hardness, a low coefficient of friction, and excellent wear resistance.

Specifications of Custom C Carbon Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%), 4N5(99.995%),5N(99.999%).6N(99.9999%).

Main Classifications

Pure carbon targets (graphite targets): Common specifications include a diameter of 50.8 mm and a thickness of 3.18 mm, with purity reaching up to 99.999% (metals basis).

Carbide targets: These include boron carbide (B4C), tantalum carbide (TaC), niobium carbide (NbC), and nickel carbide (Ni3C), each possessing unique properties.

Specialty carbon targets: Examples include carbon targets used for magnetic recording films, which require a Raman peak intensity ratio (IG/ID) of ≤5.0 for the G-band and D-band; this specification addresses issues such as the tendency of carbon to agglomerate and the detachment of carbon chunks during sputtering.

⚠️ Key Selection Considerations

‌Purity‌: Target purity directly affects thin-film performance; high-purity carbon targets (e.g., 99.999%) are suitable for precision applications.

‌Manufacturing Process: Carbide targets are typically produced via hot-press sintering (2000–2200°C) or hot isostatic pressing (HIP) to achieve high density.

‌Customization Needs‌: Some suppliers offer customization for special specifications, annular target designs, or bonding services (e.g., indium bonding).