Description of Co Cobalt Sputtering Target

Our Co Cobalt Sputtering Target is built to counter typical pain points from ordinary cobalt targets, including inconsistent grain structures, rate drift, and trace impurities that distort magnetic thin‑film performance. Advanced forming and heat‑treatment processes deliver well‑distributed microstructure, keeping sputtering output steady over long deposition runs. It maintains dependable film uniformity for spintronics research, magnetic storage‑related trials, and semiconductor functional layers, whether you work in academic labs or pilot manufacturing environments. Each batch goes through rigorous material inspection to hold impurity levels in check, so your experimental data stays comparable from one run to the next. Multiple standard sizes are readily available, and backing plate bonding can be completed to simplify installation inside your sputtering chamber. Custom geometries are also offered for non‑standard setups. Instead of spending hours troubleshooting defective coatings, use this cobalt target to reduce experimental variability and keep your development work moving forward smoothly. 

Features of Co Cobalt Sputtering Target

1. High-purity cobalt for quality thin films  

2. Excellent magnetic properties for storage media  

3. Dense target for stable deposition rates  

4. Ideal for hard disk and sensor applications  

5. Custom sizes for R&D and production  

6. Low impurity for device-grade performance  

7. Suitable for DC and RF magnetron systems  

8. Supplied with purity and density certificates  

9. Vacuum-sealed to prevent oxidation  

10. Reliable performance for magnetic coatings

Applications of Co Cobalt Sputtering Target

Semiconductor manufacturing: used for chip interconnect layers, barrier/contact layers, and wafer thin film deposition, especially at 7nm and below extreme nodes; cobalt targets with lower resistivity and more stable performance are accelerating their appearance.

Magnetic storage devices: used as magnetic recording layers for hard disk drives, high-purity cobalt films have excellent magnetic properties such as high magnetic permeability and stable hysteresis loops.

Optoelectronics and Display: Used for thin film preparation of solar cells, OLED panels, touch screens, and optical lenses.

Aerospace and Automotive: Used for coating engine components and electric vehicle battery coatings to enhance wear resistance and thermal stability.

Specifications of Co Cobalt Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%).