Description of Co Cobalt 99.95% Pure Sputter Target

Our 99.95% Pure Cobalt Sputter Target addresses common setbacks many researchers encounter, such as unwanted trace impurities, uneven grain growth, and shifting sputter rates that skew magnetic‑film measurement results. Meticulous raw‑material screening plus optimized thermal processing produce homogeneous grain structure and tightly controlled impurity content for consistent sputtering behaviour. This target delivers dependable film uniformity across substrates, making it well‑suited for spintronics studies, magnetic material trials and semiconductor functional‑layer development for both laboratory and pilot production. Every batch undergoes thorough material testing to guarantee purity standards are met, ensuring reliable run‑to‑run reproducibility. We supply various standard dimensions, with backing‑plate bonding available for quick chamber installation. Custom sizes can also be arranged to fit non‑standard equipment configurations. Cut down time spent troubleshooting flawed samples, and get more trustworthy datasets to keep your research and pilot projects advancing efficiently. 

Features of Co Cobalt 99.95% Pure Sputter Target

1. 99.95% pure cobalt for sputtering  

2. High-purity Co for advanced films  

3. Excellent magnetic properties for storage  

4. Dense target for stable deposition  

5. Ideal for hard disk and sensor layers  

6. Custom sizes for R&D and production  

7. Low impurity for device-grade quality  

8. Suitable for DC and RF magnetron  

9. Supplied with purity analysis certificate  

10. Vacuum-sealed to prevent oxidation

Applications of Co Cobalt 99.95% Pure Sputter Target

Semiconductor manufacturing: used for chip interconnect layers, barrier/contact layers, and wafer thin film deposition, especially at 7nm and below extreme nodes; cobalt targets with lower resistivity and more stable performance are accelerating their appearance.

Magnetic storage devices: used as magnetic recording layers for hard disk drives, high-purity cobalt films have excellent magnetic properties such as high magnetic permeability and stable hysteresis loops.

Optoelectronics and Display: Used for thin film preparation of solar cells, OLED panels, touch screens, and optical lenses.

Aerospace and Automotive: Used for coating engine components and electric vehicle battery coatings to enhance wear resistance and thermal stability.

Specifications of Co Cobalt 99.95% Pure Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%).