Description of 4N Te Tellurium Sputter Target

Our 4N Te Tellurium Sputter Target addresses the tricky volatility issues many researchers face with elemental tellurium sources. Ordinary Te targets easily over-evaporate during sputtering, causing inconsistent film thickness, rough surfaces, and hard-to-repeat test results for phase-change and topological material studies. We use 99.99% high-purity raw tellurium and specialized forming processes to achieve uniform grain distribution across the target. This stable microstructure slows excessive Te outgassing, keeping your deposition rate steady and lowering particle defects. It works great for fabricating phase-change memory films, topological insulators, and thermoelectric thin films. Every target gets strict purity and surface inspection before packing. Standard sizes are available, and backing bonding service can be arranged for safe vacuum chamber operation. Custom shapes and dimensions are also offered to fit your PVD equipment. Reduce wasted substrates from unstable Te flux and spend more time collecting reliable experimental data for your material R&D.

Features of 4N Te Tellurium Sputter Target

1. Dense Te target for stable sputtering  

2. Excellent thermoelectric properties for devices  

3. Custom sizes for R&D systems  

4. Low impurity for consistent performance  

5. Suitable for DC and RF magnetron  

6. Supplied with purity analysis certificate  

7. Vacuum-sealed for oxidation prevention  

8. Reliable quality for advanced applications

Applications of 4N Te Tellurium Sputter Target

Suitable for various single- or multi-target magnetron sputtering systems, widely used in fields such as semiconductor chips, solar photovoltaics, flat displays, and special coatings.

Specifications of 4N Te Tellurium Sputter Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 4N (99.99%)