Description of 99.95% Pure Hf Hafnium Rectangular Plate

99.95% Pure Hf Hafnium Rectangular Plate is designed for applications that demand dependable performance, dimensional accuracy, and material stability under challenging conditions. Manufactured from high-purity hafnium with a purity level of 99.95%, it offers excellent corrosion resistance, high-temperature durability, and reliable mechanical properties for aerospace, nuclear, electronics, and specialized industrial uses. Unlike standard hafnium plates that focus only on material purity, our rectangular hafnium plates are produced with attention to real application requirements, including thickness consistency, surface quality, and long-term performance. The controlled manufacturing process helps minimize material defects and provides customers with a more predictable solution for precision projects. Available in customized sizes and specifications, 99.95% Pure Hf Hafnium Rectangular Plate can meet different engineering needs, from research and development to advanced component manufacturing. With strict quality inspection and stable material characteristics, it helps engineers reduce production uncertainty and achieve reliable results in demanding environments.

Features of 99.95% Pure Hf Hafnium Rectangular Plate

1. Ultra-high thermal stability and corrosion resistance, with almost no change in structure and performance in high-temperature environments, allowing for long-term continuous sputtering operation.

2. Extremely low neutron absorption cross section is an irreplaceable neutron control material in the nuclear industry, suitable for the extreme working conditions of reactors.

3. Excellent conductivity and thermal conductivity, suitable for the DC magnetron sputtering process; large-area rectangular target material can ensure the thickness uniformity of large-sized substrate coating.

4. 99.95% high purity can effectively reduce the introduction of impurities, ensure stable electrical and thermal properties of deposited thin films, and avoid fluctuations in device performance.

5. Compared to circular target materials, rectangular ∼ plates have a larger effective sputtering area, which can significantly improve the coating efficiency of large-area substrates and reduce unit coating costs.

Applications of 99.95% Pure Hf Hafnium Rectangular Plate

Semiconductor industry: hafnium oxide thin films are made through sputtering technology and used as high dielectric constant gate dielectric materials for advanced chips, replacing traditional silicon dioxide to solve leakage current problems. This type of target material is often made into circular or rectangular flat targets, and the purity requirement is usually above 99.99%.

Optics and Coating: As a high-purity coating material, it is used in processes such as evaporation coating.

Nuclear industry: Hafnium has a high neutron absorption cross section and can be used as a control material for reactors. ‌‌

Basic Core Parameters of 99.95% Pure Hf Hafnium Rectangular Plate

Chemical formula: Hf

Purity grade: ≥ 99.95%, total impurity proportion ≤ 0.05%, with zirconium element content strictly controlled within 0.5%

Appearance: Silver gray metallic luster dense rectangular plate, supports customization of different length, width, and thickness specifications, suitable for large-area linear sputtering coating equipment

Theoretical density: 13.31 g/cm ³, the actual density of qualified products can reach over 99% of the theoretical density

Melting point: 2227 ℃, excellent thermal stability

Surface roughness: Sputtering surface Ra ≤ 1.6 μ m, meeting the high-precision requirements for large-area coating