Description of ZrC Zirconium Carbide Sputtering Target

Zirconium carbide stands out for exceptional hardness and robust thermal stability, making it a preferred source for high‑end functional thin‑film deposition. Sintered carbide materials carry practical production hurdles; trapped micro‑voids or uneven grain growth can trigger random particle ejection during sputtering. These stray particles contaminate substrates and throw off film consistency, creating frustrating variability for sensitive material‑science trials. Our ZrC zirconium carbide sputtering target is sintered under closely tuned thermal cycles to achieve dense, uniform microstructure across the whole target body. It delivers mechanically resilient, heat‑resistant thin‑films well suited for protective coating research and advanced component prototyping. Every target passes dimensional verification and meticulous surface defect screening before packaging. Compatible with common magnetron sputtering hardware for lab and pilot‑scale workflows. Its optimised internal structure cuts down particle‑spitting risks, delivering steady deposition behaviour and reliable, repeatable test results for your high‑spec thin‑film development work.

Features of ZrC Zirconium Carbide Sputtering Target

Zirconium carbide for demanding coatings

Extreme hardness for wear‑resistant layers

Excellent thermal shock resistance

Ideal for aerospace and nuclear sectors

Dense target for stable sputter rates

Low impurity for device‑grade films

Custom dimensions for R&D systems

Suitable for RF and DC magnetron

Supplied with full material certification

Vacuum‑sealed to prevent oxidation

Applications of ZrC Zirconium Carbide Sputtering Target

Magnetron sputtering coating: Used to deposit hard ZrC thin films, enhancing the wear and high-temperature resistance of cutting tools and mold surfaces.

Nuclear energy sector: Serves as a nuclear fuel cladding material or an alternative to uranium carbide (due to similar crystal structures and the absence of radioactivity).

Aerospace thermal protection: Utilized for its high melting point and ablation resistance.

Specifications of ZrC Zirconium Carbide Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%).