Description of ZrC Zirconium Carbide Sputter Target

Zirconium carbide brings outstanding thermal stability and mechanical hardness, making it a desirable source for high‑performance protective thin‑films. Sintered carbide targets come with known practical risks: internal voids or inconsistent grain growth can trigger particle spitting during sputtering, which contaminates substrates and creates inconsistent coating results for precision lab trials. Our ZrC zirconium carbide sputter target is manufactured under tightly controlled sintering conditions to deliver dense, uniform microstructure across the entire target body. It performs reliably for magnetron sputtering, producing robust high‑temperature‑resistant films for material‑science research and functional protective coating development. Every target goes through dimensional checks and thorough surface defect screening before packaging. Compatible with most standard sputtering setups for laboratory and pilot‑scale work. Its optimised material structure lowers particle‑generation risks, helping you maintain stable deposition cycles and obtain repeatable test data for your advanced thin‑film projects.

Features of ZrC Zirconium Carbide Sputter Target

1. Zirconium carbide for high‑temp coatings 

2. Exceptional hardness for wear‑resistant films  

3. Excellent thermal shock resistance  

4. Ideal for aerospace and nuclear uses  

5. Dense target for stable sputtering  

6. Low impurity for consistent thin‑film quality  

7. Custom sizes for R&D and production  

8. Suitable for RF and DC magnetron  

9. Supplied with purity and density certificates  

10. Vacuum‑sealed for contamination‑free use

Applications of ZrC Zirconium Carbide Sputter Target

Magnetron sputtering coating: Used to deposit hard ZrC thin films, enhancing the wear and high-temperature resistance of cutting tools and mold surfaces.

Nuclear energy sector: Serves as a nuclear fuel cladding material or an alternative to uranium carbide (due to similar crystal structures and the absence of radioactivity).

Aerospace thermal protection: Utilized for its high melting point and ablation resistance.

Specifications of ZrC Zirconium Carbide Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%).

⚠️  Key Points for Use

Sputtering conditions: ZrC has a high melting point, and high power density is usually required during sputtering. The vacuum degree and purity of the working gas (such as argon) are strictly required to avoid introducing impurities into the film.

Preparation process: The target material is generally made from high-purity powder through cold isostatic pressing and high-temperature sintering. The purity, flowability, and filling density of the powder directly affect the uniformity of the target material and the quality of the thin film. ‌‌