Description of ZrC+2%Ta Sputtering Target

Zirconium‑carbide‑tantalum composite targets deliver enhanced thermal‑mechanical performance for high‑stress thin‑film deposition. Poor powder homogenisation or unstable sintering can create local compositional deviations, bringing unexpected cracking and arcing during sputtering. These defects ruin coating consistency and add frustrating variability to high‑temperature protective‑film research. Our ZrC+2%Ta sputtering target is manufactured with precise powder blending and carefully tuned sintering cycles to realise uniform composite microstructure. The controlled tantalum fraction improves thermal shock resistance across the target body. It produces robust composite ceramic films suited for extreme‑environment coating studies and advanced component prototyping. Each target undergoes compositional validation, dimensional measurement, and thorough surface defect screening before shipment. Suited for lab‑scale and pilot magnetron sputtering systems. Balanced material properties suppress crack‑related failures, delivering stable sputter behaviour and repeatable test data for your high‑performance thin‑film development projects.

Basic Characteristics of Materials

ZrC (Zirconium Carbide): A transition metal carbide with a high melting point (3540 ℃) and high hardness (microhardness 2600kg/mm ²), presenting a gray face-centered cubic lattice with a theoretical density of 6.66g/cm ³. It undergoes significant oxidation at 1100-1400 ℃.

Ta (tantalum) doping effect: Adding 2% Ta is usually to improve the conductivity, toughness, or microstructure uniformity of the target material, while utilizing the high-temperature stability of TaC (melting point 3880 ℃) to enhance overall performance.

Features of ZrC+2%Ta Sputtering Target

1. ZrC with 2% tantalum addition  

2. Enhanced toughness for demanding coatings  

3. Excellent high-temperature oxidation resistance  

4. Ideal for aerospace and nuclear applications  

5. Dense target for uniform sputtering  

6. Low impurity for consistent thin-film quality 

7. Custom sizes for R&D and production 

8. Suitable for RF and DC magnetron systems  

9. Supplied with composition analysis certificate 

10. Vacuum-sealed for contamination-free handling

Applications of ZrC+2%Ta Sputtering Target

Magnetron Sputtering Coating: ZrC target material is a magnetron sputtering coating material used to deposit hard, wear-resistant, and high-temperature-resistant zirconium carbide thin films on the surface of substrates.

Semiconductor/electronic field: Sputtering targets are key materials in integrated circuits, information storage, and other fields. Carbide targets can be used as barrier or protective layers to prevent metal diffusion.

High-temperature protective coating: With the high melting point and hardness of ZrC, the film can be used for high-temperature wear-resistant scenarios such as tool coating, mold protection, and aircraft engine blade protection. ‌‌

Specifications of ZrC Zirconium Carbide Sputtering Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 3N5(99.95%), 4N(99.99%).