Description of WO3 Tungsten Trioxide 99.5% Pure Sputter Target

Our 99.5% Pure WO₃ Tungsten Trioxide Sputter Target addresses oxygen loss issues common in oxide thin film deposition. Many standard WO₃ targets have inconsistent density. Oxygen escapes easily during sputtering, disrupting the chemical composition and causing unstable optical response, which messes up your electrochromic device and gas sensor tests. We use qualified raw powder and optimized sintering to create a dense, uniform target body. Its stable microstructure helps retain oxygen content during deposition and reduces film defects. It works well for electrochromic coatings, gas sensing layers, and semiconductor thin film research. Every target goes through composition and surface inspection before shipment. Standard sizes are available, and backing plate bonding can be offered for steady performance in vacuum chambers. Custom shapes and dimensions are also available to fit your PVD setup. Reduce wasted substrates caused by uneven film quality, and focus more on collecting reliable experimental data for your functional material development. 

Features of WO3 Tungsten Trioxide 99.5% Pure Sputter Target

Excellent cathodic electrochromic properties: high coloration efficiency, good reversibility, fast response speed, and long cycle life.

Broad-spectrum infrared modulation capability: allows for wide-range adjustment of solar spectral transmittance, meeting the needs of smart energy-saving applications.

High specific capacitance for ion storage: an ideal candidate material for solid-state lithium battery cathodes.

High density and low porosity: a stable sputtering process effectively reduces particle splashing and ensures film uniformity.

Chemically stable: resistant to most environmental corrosion at room temperature and compatible with standard PVD coating processes.

Applications of WO3 Tungsten Trioxide 99.5% Pure Sputter Target

Electrochromic devices: Leverages high coloration efficiency and good reversibility for applications such as smart windows and automotive anti-glare rearview mirrors; this is the primary application for this type of target.

Semiconductors and photodetection: Sputtered WO₃ films can be used to fabricate ultraviolet (UV) photodetectors, with performance significantly influenced by process parameters such as sputtering gas pressure.

Scientific research and device fabrication: Suitable for single-target or multi-target sputtering systems; commonly used for thin-film deposition in fields such as micro/nano-fabrication, solar photovoltaics, flat-panel displays, and specialized coatings.

Specifications of WO3 Tungsten Trioxide 99.5% Pure Sputter Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 2N5 (99.5%)