Description of White Nb2O5 Niobium Oxide Sputtering Target

White Nb2O5 Niobium Oxide Sputtering Target is designed for thin-film applications where optical performance, film consistency, and stable deposition matter. Made from niobium pentoxide with controlled material quality, it provides a reliable source for sputtering processes used in optical coatings, electronic devices, dielectric films, and advanced surface engineering. For many coating projects, the challenge is not simply choosing Nb2O5, but keeping the deposited film consistent throughout the process. Target quality, density, composition, and surface condition can all affect deposition behavior and final film performance. This niobium oxide sputtering target is produced under controlled manufacturing conditions to help reduce material variation and support repeatable deposition results. Nb2O5 is valued for its optical and dielectric properties, making it useful where controlled refractive index, transparency, and electrical characteristics are required. The target can be supplied in different sizes and configurations to match specific sputtering equipment and application needs. Whether you are developing optical thin films, dielectric layers, or functional coatings, White Nb2O5 Niobium Oxide Sputtering Target offers a practical material solution focused on process consistency, reliable quality, and easier production control.

Features of White Nb2O5 Niobium Oxide Sputtering Target

✅ Controlled appearance and purity

✅ Dense, stable sputtering characteristics

✅ Excellent intrinsic optical properties

✅ Versatile application suitability

Applications of White Nb2O5 Niobium Oxide Sputtering Target

Optical coating: filter, lens coating, optical interference filter, etc.

Display and Touch: Media layer for flat panel displays and touch screens.

Architectural and automotive glass: functional coating.

Energy storage: electrochromic devices and supercapacitor electrode materials.

Sensor: Gas sensor film.

Specifications of White Nb2O5 Niobium Oxide Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)

Preparation Process

Powder metallurgy method: After pressing niobium oxide powder and sintering at high temperature, it has low cost and is suitable for large-sized target materials, but the density and uniformity are relatively low.

Plasma spraying method: the spray granulated Nb ₂ O ≮ feed can be formed by plasma spraying to prepare large-sized rotating targets, and the coating density can reach more than 95%, which is suitable for rotating targets with a length of 4000 mm. ‌‌