Description of Nb2O5 Niobium Oxide 99.9% Pure Sputtering Target

Our 99.9% Pure Nb₂O₅ Niobium Oxide Sputtering Target solves common challenges in dielectric thin-film fabrication. Low-quality niobium oxide targets often have inconsistent density and poor grain uniformity. This causes excessive particle contamination and unstable refractive index, which ruins your optical coatings and microelectronic device experiments. We adopt high-purity raw powder and precision sintering technology to produce dense, homogeneous targets. The stable microstructure maintains reliable stoichiometry throughout sputtering, cutting down film defects and delivering uniform dielectric layers. It fits optical filters, anti-reflection coatings, thin-film capacitors, and semiconductor research. Each target undergoes strict composition and surface checks before delivery. Standard sizes are available, and backing plate bonding can be offered for stable vacuum chamber operation. Custom shapes and dimensions are also made to match your PVD system. Reduce wasted substrates caused by fluctuating film properties, and focus more on collecting repeatable optical and electrical data for your R&D work. 

Features of Nb2O5 Niobium Oxide 99.9% Pure Sputtering Target

High refractive index: The refractive index ranges from approximately 2.2 to 2.4 across the visible to near-infrared spectrum, enabling the fabrication of thinner optical films while reducing film stress and enhancing adhesion.

Broad transparency window: It exhibits excellent light transmission in the 400–2000 nm range with negligible absorption in the near-infrared region, meeting the requirements of near-infrared optical systems.

High dielectric constant: The dielectric constant reaches 20–40, and the bandgap is approximately 3.4 eV, making it a cost-effective candidate material for high-k dielectric layers.

Excellent chemical stability: It resists corrosion from most acids and alkalis at room temperature (except hydrofluoric acid), and the film is resistant to moisture absorption and fogging in high-temperature, high-humidity environments.

High density and low porosity: The sputtering process is stable, significantly reducing arcing and particle splashing, thereby ensuring film uniformity and high production yields.

Applications of Nb2O5 Niobium Oxide 99.9% Pure Sputtering Target

Optical coating: Leveraging Nb₂O₅'s high refractive index (approx. 2.2–2.4) and broad transparency window (400–2000 nm), it is used to produce anti-reflective coatings, high-reflectivity coatings, optical filters, and lens coatings; it achieves the same optical path length with a thinner layer compared to SiO₂.

Energy-efficient glass: Used in coatings for Low-E (low-emissivity) glass and electrochromic smart windows, it enables visible light transmission and infrared heat reflection, thereby reducing building energy consumption.

Semiconductor industry: As a candidate material for high-k gate dielectrics, resistive RAM (RRAM), and MIM capacitor dielectric layers, it typically requires higher purity levels (semiconductor grade ≥99.995%).

Decorative coating: Structural colors are produced by controlling film thickness and structure; used in surface treatments for high-end watches, mobile phone casings, and bathroom hardware, offering both wear and corrosion resistance. 

Specifications of Nb2O5 Niobium Oxide 99.9% Pure Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)