Description of MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target

MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target is developed for applications that require consistent oxide film quality, accurate material composition, and stable sputtering performance. Manufactured from high-purity molybdenum oxide, it provides a reliable source of material for thin-film deposition in semiconductor research, optical coatings, electronic devices, and functional oxide materials. In advanced deposition processes, small differences in target quality can influence film properties, process stability, and research results. This MoO3 sputtering target is produced with controlled purity, uniform structure, and strict quality standards to help reduce material variations and improve deposition repeatability. Its stability makes it suitable for customers who need predictable performance during development and production. Rather than focusing only on purity values, this target is designed around practical application needs, including stable operation, equipment compatibility, and consistent output. Available in customized sizes and specifications, it can be adapted to different sputtering systems and project requirements. With dependable material quality and flexible customization options, MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target provides a practical solution for engineers and researchers working on next-generation thin films and advanced oxide-based technologies.

Features of MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target

1. The high purity of 3N5 can effectively reduce the introduction of impurities, avoid deep-level defects, and ensure the stability of the electrical and optical properties of deposited thin films.

2. High density and low porosity, stable sputtering process, significantly reducing particle splashing, ensuring uniform film thickness on large-sized substrates.

3. Excellent hole transport characteristics and high transmittance make it an ideal hole injection layer material for organic optoelectronic devices.

4. The chemical properties are stable, resistant to most environmental corrosion at room temperature, and the performance of the film is not easily degraded in atmospheric environments.

Applications of MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target

1. In the field of optoelectronic devices, the preparation of hole injection layer thin films for OLED and organic solar cells significantly improves the photoelectric conversion efficiency and service life of the devices.

2. In the field of energy storage, electrode films for lithium-ion batteries and supercapacitors are prepared to enhance the specific capacity and cycling stability of energy storage devices.

3. In the field of gas sensing, sensitive thin films for toxic and harmful gas sensors such as NO ₂ and H ₂ S are prepared to improve the detection sensitivity and response speed of the sensors.

4. Cutting-edge research scenarios: magnetron sputtering systems are widely adopted by various universities and research institutes, used for research in cutting-edge directions such as two-dimensional transition metal oxides and new optoelectronic devices.

Specifications of MoO3 Molybdenum Oxide 99.95% Pure Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)