Description of Custom 3N5 WO3 Sputter Target

Custom 3N5 WO3 Sputter Target is designed for customers who need reliable tungsten oxide material with precise specifications and consistent sputtering performance. Made from tungsten oxide with 99.95% purity, it provides a stable material source for thin-film deposition in optical coatings, electronic devices, energy-related technologies, and advanced material research. In many sputtering applications, the challenge is not simply obtaining a target, but maintaining consistent film quality while meeting specific equipment and process requirements. This customized WO3 sputter target is manufactured with controlled composition, uniform structure, and accurate dimensions to help reduce process adjustments and improve deposition repeatability. Unlike standard products with limited configurations, our custom WO3 targets focus on solving practical production needs, including size flexibility, application compatibility, and stable long-term performance. The controlled material quality helps support reliable sputtering behavior and more predictable thin-film results. Available in different shapes, sizes, and specifications, Custom 3N5 WO3 Sputter Target can be tailored for research projects, prototype development, and industrial production. With strict quality control and customer-oriented customization, it provides a dependable solution for engineers seeking better process stability and efficient material utilization.

Features of Custom 3N5 WO3 Sputter Target

1. High purity (3N5): With a purity of 99.95% and low impurity content, it can ensure the uniformity and stable performance of the deposited film.

2. Electrochromic performance: WO3 is a typical cathode colored electrochromic material with advantages such as high coloring rate, good reversibility, short response time, and long lifespan.

3. Optical modulation capability: With broad-spectrum infrared modulation capability, it can adjust the solar spectrum (such as Δ Tsol=45%).

4. Physical properties: Density of approximately 7.16 g/cm ³, melting point of 1473 ° C, insoluble in water, soluble in alkali, and slightly soluble in acid.

5. Customization flexibility: The size, shape (flat or rotating target), and surface treatment process can be adjusted according to needs.

Applications of Custom 3N5 WO3 Sputter Target

Optical and Electronic Coating: Used as a source material in glass coating and electronic component manufacturing, endowing thin films with specific optical, electrical, or protective properties.

Sensors and Catalysis: Potential Applications in Some Sensor or Catalysis Fields

Specifications of Custom 3N5 WO3 Sputter Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)

Attention: Tungsten oxide is a brittle ceramic material with high processing and bonding requirements. It is recommended to confirm the density (≥ 99%) and specific impurity element content (such as alkali metal content, such as Fe, Na, K, etc.) during procurement, as this directly affects the sputtering stability and film performance.