Description of CoO Cobalt Oxide Sputtering Target

Our CoO Cobalt Oxide Sputtering Target solves common headaches during oxide thin‑film deposition. Many cobalt oxide targets struggle with oxygen deficiency and uneven density, which shifts film stoichiometry and creates particle defects that mess up your catalytic or semiconductor test samples. We use carefully selected oxide powder and controlled sintering to preserve consistent CoO stoichiometry across the entire target. Its dense, uniform microstructure reduces oxygen escape and particulate generation while sputtering. This makes it well suited for research on catalytic coatings, magnetic oxide layers, and semiconductor functional films. Every target gets composition and surface inspection before shipment. Standard sizes are available, and backing plate bonding can be supplied for steady chamber runs. We also accept custom dimensions to match your PVD equipment. Cut down wasted substrates from unstable oxide films, and focus your effort on gathering reliable electrical and catalytic performance data for your research. 

Features of CoO Cobalt Oxide Sputtering Target

1. High-purity cobalt oxide for thin films  

2. Dense CoO target for stable sputtering  

3. Ideal for battery and catalyst research  

4. Excellent electrochemical properties for energy  

5. Custom sizes for R&D systems  

6. Low impurity for consistent results 

7. Suitable for RF magnetron sputtering  

8. Supplied with purity analysis certificate  

9. Vacuum-sealed for oxidation protection  

10. Reliable quality for advanced applications

Applications of CoO Cobalt Oxide Sputtering Target

Battery Sector: This is one of the primary applications for cobalt oxide sputtering targets. Specifically, lithium cobalt oxide (LiCoO₂) targets are mainly used to produce cathode material films for all-solid-state thin-film lithium-ion batteries, which find applications in vehicles, telecommunications equipment, and household appliances.

Magnetic Storage: Incorporating cobalt oxides and non-magnetic oxides into CoCrPt-based alloy targets helps reduce arcing and particle generation during sputtering, resulting in more uniform film composition; these are used to manufacture magnetic storage media.

Catalysis and Electroplating: Cobalt oxide films can serve as catalyst supports or active components, and are also used in electroplating processes to create high-hardness, wear-resistant coatings.

Specifications of CoO Cobalt Oxide Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)

⚠️  Selection and Usage Precautions

Distinguishing between metal cobalt targets and cobalt oxide targets: Metal cobalt targets (Co) are mainly used for magnetic storage and battery transition layers, with a density of about 8.9 g/cm ³ and a melting point of 1495 ° C; The cobalt oxide target is a ceramic target material, and the two cannot be mixed.

Pay attention to purity and density: High purity can reduce the impact of impurities on the film, while high density can improve the uniformity of the film and its adhesion to the substrate.

Toxicity protection: Cobalt and its oxides have certain toxicity, and attention should be paid to protection during use and waste disposal.