Description of B4C Boron Carbide Sputter Target

Boron carbide is a high‑performance ceramic prized for extreme hardness and outstanding neutron‑absorbing properties. Porosity within sintered bodies creates common pain points: particle ejection and surface fracturing under RF sputtering, which introduces substrate contamination and breaks experimental repeatability. Our B4C boron carbide sputter target is sintered with refined parameters to reduce internal voids and keep consistent density throughout the component. It yields dense, robust thin‑films well‑matched for wear‑resistant surface protection and neutron‑attenuating coatings, supporting advanced material‑related research. Every piece undergoes density testing, dimensional check, and comprehensive surface evaluation before dispatch. It pairs well with standard RF magnetron sputtering equipment for lab and pilot‑scale workflows. Reduced particle generation keeps your substrates clean, enabling steady, reproducible film outcomes as you develop high‑performance functional coating solutions.

Features of B4C Boron Carbide Sputter Target

1. High‑purity boron carbide sputter target  

2. Extreme hardness for wear‑resistant films  

3. Excellent neutron absorption for nuclear uses  

4. Custom dimensions for R&D sputter guns  

5. Dense microstructure for stable sputtering  

6. Ideal for protective and optical coatings  

7. Low impurity for consistent thin‑film quality  

8. Suitable for RF magnetron systems  

9. Supplied with full material certification  

10. Vacuum‑sealed for immediate installation

Applications of B4C Boron Carbide Sputter Target

Ultra-hard protective coatings: Used for surface strengthening of mechanical parts, cutting tools, and molds to enhance wear resistance.

Nuclear industry: Utilized for neutron shielding and control rod materials due to its high thermal neutron absorption capacity (e.g., 3M’s ¹⁰B-enriched boron carbide products).

Optical thin films: Used to produce infrared optical protective coatings, leveraging its infrared transparency.

Specifications of B4C Boron Carbide Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Purity: 2N(99%), 2N5(99.5%).