Description of AlO2O3 Aluminum Oxide Sputtering Target

Our Al₂O₃ Aluminum Oxide Sputtering Target solves common issues for dielectric thin‑film deposition. Standard alumina targets often have inconsistent grain structure, causing particle contamination and uneven insulating performance that compromises your semiconductor and optical samples. We use high‑purity raw powder and precisely controlled sintering to form a dense, uniform target body. The stable microstructure limits particle release during sputtering, delivering consistent dielectric layers ideal for gate insulation, protective coatings, and optical thin‑film R&D. Each target undergoes strict purity and homogeneity checks before shipment. We supply standard sizes and offer backing plate bonding for stable chamber operation. Custom shapes and dimensions can be produced to match your PVD equipment. Reduce wasted substrates from defective films, so you can focus on collecting reliable electrical and optical test data for your research projects.

Features of AlO2O3 Aluminum Oxide Sputtering Target

1. Aluminum oxide for dielectric thin films  

2. Dense Al₂O₃ for stable sputtering  

3. Ideal for gate dielectric layers  

4. Excellent hardness for protective coatings  

5. Custom sizes for R&D systems  

6. Low impurity for device-grade performance  

7. Suitable for RF magnetron sputtering  

8. Supplied with purity analysis certificate 

9. Vacuum-sealed for contamination control  

10. Reliable quality for optical and electronic use

Applications of AlO2O3 Aluminum Oxide Sputtering Target

In the semiconductor field, it is used as a dielectric layer, passivation layer, or insulation layer to enhance the performance and reliability of microelectronic devices such as capacitors and transistors.

In the field of optics: preparing anti-reflective coatings, high-reflective coatings, and transparent conductive films to improve the performance of optical components.

In the field of decorative protection: utilizing its wear resistance and chemical stability, it is used as a surface coating for furniture, building materials, and other materials to extend their service life. ‌‌

Specifications of AlO2O3 Aluminum Oxide Sputtering Target

Circular Sputtering Targets (Diameter): 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” up to 21”

Rectangular Sputtering Targets (Width x Length): 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 4N (99.99%).