Description of 99.9% Pure LiTaO3 Sputtering Target

Our 99.9% Pure LiTaO₃ Lithium Tantalate Sputtering Target addresses key challenges for ferroelectric thin-film fabrication. Standard lithium tantalate targets often face lithium volatilization during sputtering, which breaks stoichiometric balance, triggers film defects, and leads to inconsistent test results for your acoustic and optoelectronic devices. We use high-grade raw powder and precisely controlled sintering to maintain uniform density and stable LiTaO₃ composition across the target. This effectively suppresses lithium loss and particle generation. It is ideal for surface acoustic wave devices, integrated photonics, and ferroelectric functional film research. Every target undergoes strict composition and surface quality inspection before shipment. Standard sizes are available, and backing plate bonding can be provided for reliable chamber performance. Custom dimensions can also be manufactured to match your PVD setup. Reduce scrapped substrates due to unstable film properties and spend more lab time collecting repeatable electrical and optical data for your R&D projects. 

Features of 99.9% Pure LiTaO3 Sputtering Target

Combining excellent ferroelectric, piezoelectric, and electro-optic properties, the thermal stability is much higher than that of lithium niobate materials in the same system

High dielectric constant and low dielectric loss, stable performance in high-frequency scenarios

High density and low porosity, smooth sputtering process, can significantly reduce particle splashing, ensuring film uniformity

Stable chemical properties, insoluble in water, suitable for various mainstream magnetron sputtering and PVD coating processes

Applications of 99.9% Pure LiTaO3 Sputtering Target

Surface acoustic wave devices: preparation of high-frequency SAW filters and resonators, widely used in 5G/6G communication terminals and base station equipment.

Integrated optics field: deposition of optical waveguide thin films for optical modulators, nonlinear optical devices, and optical communication systems.

Sensors and actuators: Preparation of high-precision piezoelectric sensors, pyroelectric infrared detectors, and microelectromechanical system actuators

Special optoelectronic coating: used for preparing high-end optoelectronic devices such as nonlinear optical crystal thin films and electro-optic modulation thin films.

Specifications of 99.9% Pure LiTaO3 Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)