Description of 99.9% Pure LiNbO3 Sputtering Target

Our 99.9% Pure LiNbO3 Lithium Niobate Sputtering Target solves common difficulties in ferroelectric thin-film fabrication. Standard lithium niobate targets often suffer from lithium volatilization during sputtering, which breaks stoichiometric balance and creates inconsistent film properties that disrupt your optoelectronic and acoustic device testing. We use high-quality raw powder and precision sintering to maintain stable LiNbO3 composition throughout the target. Its dense and homogeneous microstructure reduces lithium loss and particulate formation. This target is ideal for surface acoustic wave devices, integrated photonics, ferroelectric thin films, and optical coating research. Each target is strictly inspected for composition and surface quality before shipment. Standard sizes are in stock, and backing plate bonding is available for reliable chamber performance. Custom dimensions can also be produced to match your PVD fixture. Reduce scrapped substrates caused by compositional drift, and spend more lab time collecting repeatable optical and electrical data for your photonic development projects. 

Features of 99.9% Pure LiNbO3 Sputtering Target

Possesses excellent ferroelectric, piezoelectric, and nonlinear optical properties; one of the few functional materials suitable for both optoelectronic and acoustoelectronic applications.

High density and low porosity ensure a stable sputtering process, effectively preventing film defects caused by particle splashing.

Strict control of the lithium-to-niobium stoichiometric ratio ensures consistent optoelectronic performance in deposited films.

Supports processes such as copper backing plate bonding and is compatible with various commercial RF sputtering and PVD coating systems.

Applications of 99.9% Pure LiNbO3 Sputtering Target

Integrated Optics: Deposition of silicon-based lithium niobate thin films for high-performance optical waveguides, modulators, and filters; meets mass production requirements for photonic integrated circuits.

Surface Acoustic Wave (SAW) Devices: Fabrication of high-frequency filters, resonators, and sensors; meets performance requirements for high-frequency devices in 5G/6G communications.

Nonlinear Optics: Fabrication of second-harmonic generators and optical parametric oscillators for the generation and modulation of specific laser wavelengths.

Specialty Electronic Devices: Fabrication of functional thin films for devices such as ferroelectric memories and pyroelectric infrared detectors.

Specifications of 99.9% Pure LiNbO3 Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)

⚠️  Selection Focus

When purchasing, special attention should be paid to purity grade, relative density, whether it has undergone hot isostatic pressing treatment, and whether the backplate material and welding method match the equipment. The density and grain orientation uniformity of the target material directly affect the quality of the thin film. ‌‌