Description of 99.9% Pure Li4SiO4 Sputtering Target

Our 99.9% Pure Li₄SiO₄ Sputtering Target solves a critical issue in lithium‑bearing thin‑film fabrication. Many lithium silicate targets lose lithium easily during sputtering, breaking chemical balance and creating inconsistent solid electrolyte layers that skew your battery test outcomes. We use qualified lithium silicate powder and carefully controlled sintering to preserve stable stoichiometry across the whole target. Its dense, uniform microstructure greatly reduces lithium volatilization and particle shedding. This target fits solid-state battery electrolyte research and lithium functional coating studies. Every target is checked for composition and surface quality before delivery. Standard sizes are ready, and backing plate bonding can be arranged for steady chamber performance. We also make custom dimensions to match your PVD fixture. Cut down on scrapped substrates from composition drift, and spend more lab time collecting repeatable electrochemical data for your battery R&D projects. 

Features of 99.9% Pure Li4SiO4 Sputtering Target

Exhibits excellent thermal stability, maintaining structural and performance integrity in high-temperature environments.

Possesses high lithium-ion conductivity, making it an ideal raw material for producing solid-state electrolyte thin films.

Features high lithium content, providing an abundant lithium source for nuclear-related applications.

Chemically stable and highly compatible with standard sputtering processes, ensuring excellent thin-film deposition uniformity.

Applications of 99.9% Pure Li4SiO4 Sputtering Target

Solid-state lithium batteries: Serves as a core source material for depositing solid-state electrolyte thin films, enhancing battery cycle life and safety.

Nuclear industry: Used for producing tritium-breeding thin films for fusion reactors; a key candidate material for advanced nuclear energy systems.

Advanced ceramics and electronics: Used for depositing specialized functional ceramic thin films to improve critical device performance, such as ion conductivity.

Specifications of 99.9% Pure Li4SiO4 Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)

⚠️  Key Points for Preparation and Use of 99.9% Pure Li₄SiO₄ Lithium Silicate Sputtering Target

Difficulty: The core difficulty of target material preparation lies in controlling the volatilization of the lithium element at high temperatures and maintaining the stoichiometric ratio (Li: Si ≈ 4:1); otherwise, the film composition will deviate from the target.

Compensation strategy: Some users may request a lithium-rich formula (Li: Si slightly higher than 4:1) or introduce a small amount of lithium-containing vapor in the sputtering atmosphere to compensate for lithium loss.

Quality indicators: Similar to metal target materials, attention should be paid to purity, density, grain size, and impurity content. Pores and impurities will directly affect the quality of the film. ‌‌