Description of 3N5 WO3 Sputtering Target

3N5 WO3 Sputtering Target is developed for customers who require stable tungsten oxide material, consistent sputtering performance, and reliable thin-film quality. Manufactured from WO3 with 99.95% purity, it serves as a dependable material source for deposition processes used in optical coatings, electronic devices, energy storage research, and advanced functional materials. In thin-film production, target quality plays an important role in deposition stability and final film performance. This tungsten oxide sputtering target is produced with controlled composition, uniform material structure, and strict quality inspection to help reduce process fluctuations and improve repeatability. Its stable sputtering characteristics allow researchers and manufacturers to achieve more predictable coating results. Rather than focusing only on purity specifications, 3N5 WO3 Sputtering Target is designed to address real application challenges, including consistent material behavior, equipment compatibility, and long-term process reliability. It can be supplied in various sizes and configurations to meet different sputtering systems and project requirements. With dependable quality and flexible customization options, 3N5 WO3 Sputtering Target provides a practical solution for customers developing high-performance tungsten oxide films and next-generation thin-film technologies.

Features of 3N5 WO3 Sputtering Target

Purity Grade: 3N5 indicates a purity of ≥99.95%; classified as a high-purity target material, it meets the requirements of high-end applications such as electrochromic devices.

Material Form: Typically a bright yellow or grey-black ceramic target; produced via plasma spheroidization or ultra-high-pressure sintering using the thermal decomposition products of ammonium paratungstate or the oxidation products of high-purity tungsten powder as raw materials.

Key Parameters: Density ≥7.2 g/cm³; melting point 1473°C; insoluble in water but soluble in alkalis.

Performance Advantages: Features smart electrochromic response, high specific capacitance for ion storage, and broad-spectrum infrared modulation capabilities; characterized by high coloration efficiency, excellent reversibility, and rapid response.

Applications of 3N5 WO3 Sputtering Target

Smart windows and building curtain walls: used for electrochromic smart window coating to achieve light and heat regulation.

Optoelectronics and semiconductors: used for preparing functional thin films such as photodetectors and gas sensors.

Solid-state battery: as a lithium-ion cathode material, utilizing its high specific capacitance and ion storage capacity.

Display and anti-glare: used for automatic light intensity adjustment of car rearview mirrors, high-resolution display screens, etc.

Specifications of 3N5 WO3 Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)