Description of 3N5 Nb2O5 Niobium Oxide Sputtering Target

3N5 Nb2O5 Niobium Oxide Sputtering Target is developed for applications that require reliable oxide material quality, stable sputtering performance, and consistent thin-film results. Made from niobium pentoxide with 99.95% purity, it provides a dependable material source for optical coatings, electronic components, dielectric films, and advanced surface engineering applications. In real coating processes, target performance affects more than just deposition — it influences film uniformity, process stability, and overall production efficiency. This Nb2O5 sputtering target is manufactured with controlled composition, uniform structure, and strict quality inspection to help reduce unexpected variations and improve repeatability during sputtering operations. Rather than focusing only on purity values, the 3N5 Nb2O5 Niobium Oxide Sputtering Target is designed around practical customer needs, including stable operation, equipment compatibility, and consistent material behavior. Its excellent optical and dielectric properties make it suitable for applications requiring controlled refractive index, transparency, and electrical performance. Available in customized sizes and specifications, it can be adapted to different sputtering systems and project requirements. With dependable quality and flexible production options, it provides engineers and researchers with a practical solution for developing high-performance niobium oxide thin films.

Features of 3N5 Nb2O5 Niobium Oxide Sputtering Target

1. Outstanding optical performance: high refractive index (about 2.3 at 550 nm), suitable for precision optical coatings such as anti-reflective films, filters, and laser radar windows.

2. Excellent dielectric performance: The dielectric constant is about 35, which is about 9 times that of silicon dioxide. It can be used in scenarios such as capacitor insulation layers and semiconductor gate dielectrics.

3. Strong chemical stability: resistant to acid and alkali corrosion at room temperature (except hydrofluoric acid), with a weight loss rate of less than 0.5% at 1200 ° C, suitable for harsh working environments. ‌‌

Applications of 3N5 Nb2O5 Niobium Oxide Sputtering Target

Optical coating: alternate with SiO ₂ to coat anti-reflective film, high-reflectivity film, and filter. The refractive index is about 2.2-2.4 in the visible to near-infrared wavelength range (400-2000nm), and the absorption in the near-infrared region is extremely low.

Semiconductor: used as a high dielectric constant (k value 20-40) gate insulation layer, MIM capacitor dielectric layer, and chip passivation protection layer.

Energy-saving glass: used for low emissivity glass coating, reflecting indoor heat in winter and blocking outdoor radiant heat in summer, reducing building energy consumption.

Decorative coating: By controlling the film thickness to produce structural colors, it is applied to surface treatment of high-end watches, mobile phone cases, and other products.

Specifications of 3N5 Nb2O5 Niobium Oxide Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N5 (99.95%)