Description of 3N Tm3Fe5O12 Thulium Iron Garnet Target

Our 3N Tm₃Fe₅O₁₂ Thulium Iron Garnet target addresses common headaches for magnonics and magneto‑optical thin‑film work. Many garnet targets suffer from uneven phase formation and stoichiometry shift during sputtering, which ruins magnetic properties and makes your experimental results hard to repeat. We use carefully homogenized powder and controlled sintering to lock in the correct Tm‑Fe‑O ratio across the whole ceramic body. Low impurity levels and dense, uniform microstructure reduce phase separation, helping you grow reliable TmIG films for spintronics research and magneto‑optical device prototyping. Every target undergoes composition and phase testing before shipment. Standard sizes are ready to ship, and copper backing bonding is available for stable chamber operation. Custom dimensions can be made for your unique sputtering setup. Cut down failed deposition runs caused by inconsistent garnet material, and focus your lab time on gathering trustworthy magnetic and optical measurement data. 

Features of 3N Tm3Fe5O12 Thulium Iron Garnet Target

1. 3N thulium iron garnet sputter target

2. High-purity TmIG for magneto-optics

3. Strong faraday rotation for isolators 

4. Ideal for optical isolator coatings

5. Dense ceramic for stable deposition 

6. Compatible with RF sputtering systems 

7. Low optical loss in the near-infrared range 

8. Custom sizes for R&D systems 

9. Vacuum-sealed for contamination-free use 

10. Excellent thermal stability for sputtering

Applications of 3N Tm3Fe5O12 Thulium Iron Garnet Target

Applicable equipment: various single-target, multi-target sputtering systems, ion sputtering systems, and other magnetron sputtering equipment.

Application direction: scientific experiments and micro/nano processing, device manufacturing, widely used in fields such as semiconductor chips, solar photovoltaics, flat displays, special coatings, etc.

Research value: The TmIG thin film prepared by sputtering with this target material has research value in non-volatile magnetic storage devices, spintronics, and other fields.

Specifications of 3N Tm3Fe5O12 Thulium Iron Garnet Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 3N(99.9%).

⚠️  Usage and Storage Precautions

Storage: Dry environment, sealed packaging, handle with care, prevent pressure and collision.

Operation: Confirm surface cleanliness before use, wear clean gloves for operation, and avoid contamination by foreign objects such as oil stains.