Description of 3N LiTaO3 Lithium Tantalate Sputtering Target

Our 3N LiTaO₃ Lithium Tantalate Sputtering Target addresses typical challenges in ferroelectric thin-film deposition. Many conventional lithium tantalate targets experience lithium volatilization during sputtering, upsetting chemical balance and creating uneven film performance that interferes with your SAW and optoelectronic tests. We use high-purity raw powder and tightly controlled sintering to maintain stable LiTaO₃ stoichiometry across the target body. Its dense, uniform microstructure limits lithium loss and particle generation. It is widely used for surface acoustic wave devices, ferroelectric layers, and optoelectronic functional film research. Every target passes composition and surface inspection before shipment. Standard sizes are available, and backing plate bonding can be provided to ensure stable chamber operation. Custom geometries can also be manufactured to match your PVD setup. Reduce scrapped substrates due to compositional drift and dedicate more lab time to collecting repeatable electrical and optical data for your device development. 

Technical Highlights

Sputtering method: As LiTaO3 is an insulating material, RF magnetron sputtering is typically employed for deposition.

Impact of film thickness: As film thickness increases, island-like grains and micro-cracks appear on the surface, leading to increased surface roughness; electrical resistance rises while leakage current decreases; and the charge capacity of electrochromic devices declines.

Lithium-rich target processing: Sputtering with lithium-rich targets enables the film to achieve a higher pyroelectric coefficient, bringing its performance closer to that of bulk crystals.

Features of 3N LiTaO3 Lithium Tantalate Sputtering Target

1. 3N lithium tantalate for photonic films  

2. High-purity LiTaO₃ sputter target 

3. Excellent pyroelectric properties for sensors  

4. Ideal for SAW and waveguide devices  

5. Dense ceramic for stable deposition  

6. Custom sizes for R&D systems 

7. Low impurity for consistent film quality  

8. Suitable for RF magnetron sputtering 

9. Supplied with composition certificate  

10. Vacuum-sealed for contamination protection

Applications of 3N LiTaO3 Lithium Tantalate Sputtering Target

Electrochromic devices: LiTaO3 thin films deposited via RF magnetron sputtering serve as ion-conducting layers in devices such as smart windows.

Infrared detectors: Uncooled infrared detectors are fabricated utilizing the material's pyroelectric effect; the thin film's pyroelectric coefficient can reach 55 μC/cm²K (compared to approximately 180 μC/cm²K for bulk crystals).

Lithium battery cathode coating: Characterized by high ionic conductivity, a wide voltage window, and excellent mechanical strength, LiTaO3 serves as a surface coating for single-crystal high-nickel cathode materials, significantly enhancing cycling stability under high-temperature (60°C) and high-voltage (4.5V) conditions.

Optical devices: Nonlinear optical effects are utilized to fabricate electro-optic modulators, optical waveguides, frequency doublers, and more.

Specifications of 3N LiTaO3 Lithium Tantalate Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)