Description of 3N LiNbO3 Lithium Niobate Sputtering Target

Our 3N LiNbO₃ Lithium Niobate Sputtering Target handles common difficulties in ferroelectric thin‑film deposition. Many lithium niobate targets lose lithium easily during sputtering, which disrupts stoichiometry and creates uneven films that affect your optoelectronic and acoustic device test results. We use high‑purity raw powder and precisely controlled sintering to maintain consistent LiNbO₃ composition throughout the target. Its dense, uniform microstructure limits lithium volatilization and particle formation. It is ideal for ferroelectric thin films, surface acoustic wave devices, and integrated photonic research. Each target goes through composition and surface inspection before shipment. Standard sizes are available, and backing plate bonding can be provided for stable chamber performance. Custom geometries are also offered to fit your PVD system. Reduce wasted substrates caused by compositional shift, so you can focus your lab work on collecting repeatable optical and electrical data for your photonic development. 

Features of 3N LiNbO3 Lithium Niobate Sputtering Target

1. 3N lithium niobate for photonic films  

2. High-purity LiNbO₃ sputter target  

3. Excellent electro-optic properties for devices  

4. Ideal for waveguide and modulator research  

5. Dense ceramic for stable deposition  

6. Custom sizes for R&D systems 

7. Low impurity for consistent film quality  

8. Suitable for RF magnetron sputtering  

9. Supplied with composition certificate  

10. Vacuum-sealed for contamination protection

Applications of 3N LiNbO3 Lithium Niobate Sputtering Target

LiNbO₃ thin films deposited via sputtering using lithium niobate targets are widely used in the following fields:

‌Optical Communication and Photonic Integration‌: Fabrication of electro-optic modulators and optical waveguides; a key material for thin-film lithium niobate (TFLN) devices, often referred to as "optical silicon".

‌Acoustic Devices: Used in communication components such as surface acoustic wave (SAW) filters.

‌Ferroelectric and Piezoelectric Applications: Infrared detectors, piezoelectric sensors, high-frequency filters, etc.

‌Scientific Research: Preparation of LiNbO₃ thin films via magnetron sputtering to study their structural and electrical properties.

Specifications of 3N LiNbO3 Lithium Niobate Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)

Preparation and Selection

‌Preparation Processes: Ceramic targets are typically produced using atmospheric sintering, atmosphere sintering, or hot isostatic pressing (HIP); crystal targets are processed from grown single crystals.

‌Sputtering Methods: RF magnetron sputtering is a common method for depositing LiNbO₃ thin films, though ion beam sputtering is also applicable; using a lithium niobate target allows for flexible adjustment of the Nb-to-Li ratio in the film.

‌Selection Criteria‌: Dimensions must match the coating equipment's target stage and fixtures; density and compositional uniformity directly affect coating quality; bonding processes must be considered for high-power sputtering applications.