Description of 3N Li4SiO4 Lithium Silicate Sputtering Target

Our 3N Li₄SiO₄ Lithium Silicate Sputtering Target addresses major pain points for lithium‑containing thin‑film deposition. Many lithium silicate targets suffer from lithium volatilization and uneven density, which break stoichiometry and create inconsistent solid electrolyte films for your battery research. We adopt high‑purity raw materials and low‑temperature controlled sintering to lock in stable Li₄SiO₄ composition. The dense, uniform microstructure limits lithium loss and particle generation during sputtering. It works perfectly for solid-state battery electrolytes and lithium‑based functional coating studies. Each target undergoes composition and surface inspection before shipment. Standard sizes are available, and backing plate bonding can be supplied for stable chamber runs. Custom geometries are also offered to match your PVD system. Reduce wasted substrates caused by lithium drift, and focus more of your lab time collecting reliable electrochemical data for your battery development work.

Features of 3N Li4SiO4 Lithium Silicate Sputtering Target

1. 3N lithium silicate for solid electrolytes  

2. High-purity Li₄SiO₄ for battery research  

3. Dense ceramic for stable sputtering  

4. Ideal for solid-state battery interfaces  

5. Excellent ionic conductivity for energy devices  

6. Custom sizes for R&D systems 

7. Low impurity for consistent film quality 

8. Suitable for RF magnetron sputtering  

9. Supplied with composition certificate 

10. Vacuum-sealed for moisture protection

Applications of 3N Li4SiO4 Lithium Silicate Sputtering Target

Solid-state electrolytes: Used as solid-state electrolyte materials for lithium batteries; although their ionic conductivity is lower than that of LLZO or LAGP, they offer good chemical stability, excellent interfacial compatibility with lithium metal, and low cost.

Tritium-breeding coatings for nuclear fusion: Tritium-breeding layers deposited onto the surfaces of RAFM steel or tungsten-copper composites (e.g., via magnetron sputtering), featuring thicknesses ranging from tens to hundreds of microns, high specific surface area, and high tritium release efficiency.

Specifications of 3N Li4SiO4 Lithium Silicate Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 3N (99.9%)

⚠️  Sputtering Difficulties and Countermeasures

This is the most important aspect to pay attention to when sputtering Li ₄ SiO ₄ target materials, and it is also the technical threshold for suppliers:

Lithium deficiency problem: During sputtering, Li ₂ O on the surface of the target material will decompose and segregate, resulting in insufficient lithium content in the deposited film.

Compensation plan: A rich lithium formula target material (Li: Si atomic ratio slightly higher than 4:1) can be required, or a small amount of lithium-containing vapor can be introduced into the sputtering atmosphere to compensate.

Better solution: Studies have shown that using independently controlled multi-source co-deposition (such as separate sputtering of Li ∝ PO ₄ and Li ₄ SiO ₄) onto a rotating substrate makes it easier to obtain thin films with stable stoichiometry.