2N5 ZrC+2%Ta Zirconium Carbide Sputter Target
2N5 ZrC+2%Ta Zirconium Carbide Sputter Target
2N5 ZrC+2%Ta Zirconium Carbide Sputter Target
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2N5 ZrC+2%Ta Zirconium Carbide Sputter Target

Description of 2N5 ZrC+2%Ta Zirconium Carbide Sputter Target

Composite carbide sputter targets face real‑world operating challenges when deployed for high‑heat sputtering cycles. Impurity inclusions and uneven powder mixing can create local compositional offsets, triggering thermal‑stress cracking and sporadic arcing. These issues introduce film inconsistencies and waste valuable trial runs for extreme‑condition protective‑coating research. Our 2N5 ZrC+2%Ta zirconium carbide sputter target uses low‑impurity starting powders paired with meticulously calibrated sintering parameters. The evenly dispersed tantalum component strengthens thermal‑shock resistance across the target body. It generates durable composite ceramic thin‑films ideal for high‑temperature protective layers and advanced material‑science prototyping. Every target receives composition validation, dimensional checks, and full‑surface defect inspection before delivery. Well‑matched for laboratory and pilot‑scale magnetron sputtering setups. Optimised composite microstructure mitigates thermal‑cracking risks, supporting stable sputtering and reproducible test outcomes for your demanding thin‑film development work.

Features of 2N5 ZrC+2%Ta Zirconium Carbide Sputter Target

2N5 zirconium carbide with tantalum

ZrC + 2% Ta for enhanced toughness

Excellent high-temperature oxidation resistance

Ideal for aerospace and nuclear coatings

Dense target for stable sputter rates

Low impurity for consistent thin-film quality

Custom sizes for R&D and production

Suitable for RF and DC magnetron systems

Supplied with composition analysis certificate

Vacuum-sealed for contamination-free handling

Applications of 2N5 ZrC+2%Ta Zirconium Carbide Sputter Target

Magnetron Sputtering Coating: ZrC target material is a magnetron sputtering coating material used to deposit hard, wear-resistant, and high-temperature-resistant zirconium carbide thin films on the surface of substrates.

Semiconductor/electronic field: Sputtering targets are key materials in integrated circuits, information storage, and other fields. Carbide targets can be used as barrier or protective layers to prevent metal diffusion.

High-temperature protective coating: With the high melting point and hardness of ZrC, the film can be used for high-temperature wear-resistant scenarios such as tool coating, mold protection, and aircraft engine blade protection. ‌‌

Specifications of 2N5 ZrC+2%Ta Zirconium Carbide Sputter Target

Circular Sputtering Targets(Diameter): 1.0”2.0”3.0”4.0”5.0”6.0” up to 21”

Rectangular Sputtering Targets(Width x Length): 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”

Thickness: 0.125”,   0.25”

Shape: Disc/Rectangular

Bonding: Unbonding/Bonding

Purity: 2N(99%), 2N5(99.5%).

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