Description of 2N5 WO3 Tungsten Trioxide Sputtering Target

Our 2N5 WO₃ Tungsten Trioxide Sputtering Target solves common problems when depositing electrochromic thin films. Many WO₃ targets have uneven density and loose grain structure. During sputtering, oxygen loss easily occurs, breaking stoichiometry and leading to unstable optical switching performance, which affects your device testing and R&D progress. We use qualified raw powder and carefully controlled sintering processes to produce dense, homogeneous target material. This stable microstructure helps preserve the tungsten trioxide composition during deposition, reducing oxygen deficiency and film defects. It is widely applied in electrochromic windows, gas sensors, and semiconductor thin-film research. Each target is inspected for composition and surface quality before delivery. Standard sizes are available, and backing plate bonding can be provided for stable vacuum chamber operation. Custom shapes and dimensions can also be manufactured to match your PVD equipment. Reduce wasted substrates caused by inconsistent film properties and focus more on collecting repeatable test data for your functional material development.

Features of 2N5 WO3 Tungsten Trioxide Sputtering Target

1. 2N5 tungsten trioxide for thin films  

2. High-purity WO₃ sputter target  

3. Ideal for electrochromic smart windows  

4. Excellent gas sensing performance  

5. Dense ceramic for stable deposition 

6. Custom sizes for R&D systems 

7. Low impurity for consistent film quality  

8. Suitable for RF magnetron sputtering  

9. Supplied with composition certificate  

10. Vacuum-sealed for contamination protection

Applications of 2N5 WO3 Tungsten Trioxide Sputtering Target

In the field of electrochromic materials, WO3 is often used as the main color-changing layer material, combined with ion storage layers, for smart windows, inorganic electrochromic devices, etc. In addition, it is also used in applications such as thin-film solar cells and displays that require optical control.

Specifications of 2N5 WO3 Tungsten Trioxide Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 2N5 (99.5%)

Selection Guidelines

Purity Requirements: 2N5 purity is sufficient for standard coating applications. However, for high-performance electrochromic devices or semiconductor-grade applications, verify whether a purity of 3N5 or higher is required, as impurities can affect the film's conductivity and stability.

Customization: Target dimensions, shapes, and bonding methods (e.g., backing tube bonding) can be customized; it is recommended to confirm specific process parameters with the supplier before placing an order.