Description of 99.99% Pure Sb Antimony Sputtering Target

99.99% Pure Sb Antimony Sputtering Target is a premium-grade deposition material produced from high-purity antimony, offering consistent composition and reliable performance for advanced thin film applications. With a purity level of 99.99%, this sputtering target is carefully processed to minimize impurities, helping achieve stable deposition rates, uniform film quality, and repeatable results in demanding coating environments. Designed for semiconductor research, photovoltaic devices, infrared technologies, and functional thin film development, high-purity antimony targets provide excellent material compatibility and deposition efficiency. The controlled grain structure and optimized manufacturing process contribute to smooth sputtering performance, making them suitable for both laboratory experiments and industrial production. We understand that different applications require different material solutions. Therefore, our 99.99% Sb Antimony Sputtering Targets can be customized in various sizes, shapes, and bonding configurations to match specific equipment and process requirements. Whether for early-stage research or large-scale manufacturing, we focus on delivering dependable sputtering materials with consistent quality, flexible customization, and long-term supply support.

Features of 99.99% Pure Sb Antimony Sputtering Target

Low impurity and high consistency: 99.99% purity means that the total impurity content is controlled below one ten-thousandth (100ppm), which can effectively reduce defects in sputtered films and improve the stability of electronic devices' electrical and optical performance.

Better film quality: High purity target materials exhibit better uniformity and deposition rate on the target surface in PVD processes such as magnetron sputtering, which helps to obtain thin films with uniform thickness and stable quality.

Extended service life: The high density brought by high purity can reduce the particle problem caused by gas release from pores during sputtering of the target material. At the same time, its oxidation and corrosion resistance also improve the service life of the target material in harsh environments. ‌‌

Applications of 99.99% Pure Sb Antimony Sputtering Target

Phase change memory (PCRAM): Antimony is a key component of phase change memory materials, and high-purity antimony targets play an important role in the deposition of related thin films.

Thermoelectric conversion: used for preparing antimonide thermoelectric thin film materials.

Optoelectronic functional coating: suitable for coating processes of optical storage, laser devices, sensors, displays, and other devices. ‌‌

Specifications of 99.99% Pure Sb Antimony Sputtering Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 4N(99.99%)