Description of 4N Sb Antimony Sputter Target

4N Sb Antimony Sputter Target is a high-purity sputtering material manufactured from antimony with a purity level of 99.99%, designed for applications where stable deposition performance and reliable film quality are essential. With excellent chemical consistency, uniform composition, and controlled impurity levels, this target helps support the production of thin films with improved electrical, optical, and material properties. Our 4N antimony sputtering targets are available in customized dimensions, bonding options, and shapes to meet different requirements from research laboratories and industrial coating systems. Antimony’s unique characteristics make it valuable in semiconductor research, photovoltaic technologies, infrared devices, and advanced functional coatings. Each target is carefully processed and inspected to ensure a smooth surface, consistent microstructure, and dependable sputtering efficiency. Beyond standard supply, we focus on providing practical material solutions rather than simply delivering a product. From prototype development to large-scale production, our antimony sputter targets are engineered to offer compatibility, flexibility, and stable performance for evolving thin-film technologies.

Features of 4N Sb Antimony Sputter Target

High purity guarantee: 4N purity (99.99%) means that the total amount of metal impurities is controlled at an extremely low level, which can reduce impurity pollution in the film, ensure the stability and repeatability of electrical performance, and is a basic requirement for scientific research and high-end industrial applications.

Physical properties: Antimony has a density of approximately 6.697 g/cm ³, a melting point of 630.63 ° C, and belongs to the category of semimetals. Its conductivity is between that of metals and semiconductors, making it irreplaceable in specific doping and thin film applications.

Customizability: Different sizes, thicknesses (such as diameter 25.4mm to 101.6mm, thickness 3mm to 6.35mm), and specifications can be customized according to needs, adapting to different sputtering equipment.

Applications of 4N Sb Antimony Sputter Target

Semiconductors and Microelectronics: Used for the preparation of phase change storage materials, thermoelectric conversion films, and some optoelectronic functional coatings.

Compound semiconductors: Antimony often forms alloy targets with metals such as indium and silver (such as InSb, NiMnSb, etc.), which are used for the preparation of high-end devices such as infrared photodetectors and spin valve structures.

Thin film solar cells: Antimony-based compounds (such as antimony sulfide Sb ₂ S3) are important absorbing layer materials for thin film solar cells. ‌‌

Specifications of 4N Sb Antimony Sputter Target

Circular Sputtering Targets (Diameter): 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0”, up to 12”

Rectangular Sputtering Targets (Width x Length): 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20”

Thickness: 0.125”, 0.25”

Shape: Disc/Rectangular

Bonding: Unbonded/Bonded

Purity: 4N(99.99%)

Key Considerations for Preparation and Selection

‌Purity Grade‌: High-end applications require target purity of 4N (99.99%) or higher, with some demanding 5N (99.999%). Higher purity minimizes impurity-related defects during the coating process, resulting in more stable electrical and optical film properties.

‌Grain Size and Uniformity‌: Fine, uniformly distributed grains help improve sputtering rate stability and film uniformity.

‌Density‌: High density (e.g., relative density ≥99.3%) enhances sputtering rates and film performance while extending the target's service life.